The burner is mainly used for melting glass raw materials and forming glass. By generating a high-temperature flame, the burner enables efficient glass production, while its precise temperature control ensures high-quality glass and reduces defects in the production process. In addition, high-temperature flames can also be used for glass molding to create glass products of various shapes.
When the accumulation of glass fine particles begins, a gas obtained by mixing an inert gas with a combustion-supporting gas is supplied to the combustion-supporting gas ejection port; while increasing the flow rate of the combustion-supporting gas supplied to the combustion-supporting gas ejection port , the flow rate is reduced. The flow rate of the inert gas supplied to the combustion-supporting gas discharge port. The glass burner can increase the heating power of flame processing without unnecessarily increasing the flow rate of combustion gas , and can also improve the deposition efficiency of glass particles on porous glass preforms.
The main advantages of industrial burners are their high efficiency, high quality and high controllability. The continuous and stable high-temperature flame improves production efficiency, precise temperature control ensures the quality of the glass, and the automatic control system allows the temperature of the flame to be accurately adjusted according to different production needs. Generally, the gas flow of common burners is difficult to control and unsafe to use. However, as long as a matching flow control valve is added to the flow sensor , the problem can be effectively solved and the gas supply flow can be stabilized, ignition efficiency can be improved, and the ignition process can be guaranteed to be safe. . A gas flow control device from the Industry and Mining Network , the American SIARGO gas mass flow controller MFC2000 can be used to control the fire power of compressed gas and burners in glass processing burner fire power control management.
The gas mass flow controller MFC2000 uses the company’s proprietary MEMS Thermal-D operating “” thermal sensing technology and intelligent control electronics. This unique mass flow sensing technology eliminates the gas sensitivity of some gases with similar diffusivities. and allows gas identification after programming . This product can be used for process control with a dry dynamic range of 100:1, and its control range is a pressure of 0.1 to 0.8MPa (15 to 120 PSL) and a compensation temperature of 0 to 50°C. Measuring ranges are available from 50mL/min to 200L/min, with digital RS485 Modbus communication and analog output. The product is designed for easy replacement of mechanical connectors, with standard connectors available in dual ferrule, VCR or UNF, with other custom connectors available upon request. SIARGO’s MFC2000 flow controller plays a very important role in CVD equipment. It can accurately measure and control the size of gas, and can achieve high temperature, high precision, and high resolution film deposition processes.